尊敬的业内同仁，您好！

苏州恩正科电子有限公司诚挚地邀请您参加11月6日-8日在中国深圳·深圳坪山格兰云天国际酒店举办的第五届亚太碳化硅及相关材料国际会议。

在会议期间，苏州恩正科电子有限公司将在NO.99展台上展出最新产品和技术，我们诚挚地邀请您莅临展台，与我们进行深入的交流和探讨，共同探索合作与发展的可能性。

Distinguished delegates，

SUZHOU NZK ELECTRONICS CO., LTD. sincerely invite you to participate in the 5th Asia-Pacific Conference on Silicon Carbide and Related Materials (APCSCRM 2024)！

APCSCRM 2024 will be grandly held in Grand Skylight International Hotel Shenzhen Pingshan, China, on November 06-08, 2024, for better accelerating the academic research, technological progress and industrial upgrading of silicon carbide and other wide bandgap semiconductor industries in the Asia-Pacific region.

During the conference, SUZHOU NZK ELECTRONICS CO., LTD. will exhibit the latest products and technologies on booth NO.99. We sincerely invite you to visit our booth for in-depth exchanges and discussions, and explore the possibilities of cooperation and development together.

企业简介/Company profile

我们是一家充满活力与创新精神的互联网公司，致力于为全球用户提供最先进、最便捷的科技产品与服务。

苏州恩正科电子有限公司位于苏州市，专注于晶圆湿法清洗•刻蚀设备、产品晶圆背金及磨划、挑粒一站式代工服务、半导体磨划设备及周边辅助设备的技术型企业。公司自成立以来，就秉持以客户为先导，致力于为客户优化投资成本及提供配套产品的解决方案。为客户提供最佳的生产方案，为客户提供适配的磨轮、划片刀、胶膜和生产工艺。同时代理日本和德国等高新技术半导体生产设备。

SUZHOU NZK ELECTRONICS CO,.LTD is located in Suzhou City, focusing on wafer wet cleaning and etching equipment, product wafer back gold and grinding, picking one-stop foundry services, semiconductor grinding equipment and peripheral auxiliary equipment technology enterprises.

Since its establishment, the company has adhered to the customer-oriented, committed to optimizing investment costs for customers and providing solutions for supporting products. To provide customers with the best production plan, to provide customers with suitable grinding wheel, blade, film and production process. At the same time acting Japan and Germany and other high-tech semiconductor production equipment.

产品简介/About Production

一、MTK晶圆清洗设备

MTK wafer cleaning equipment

碳化硅衬底材料最终清洗领域市场占比80%MTK单片精密湿法处理设备是进行以药液处理、兆声波，二流体Jet、纯水冲洗、干燥等处理工艺手段。

1.适用于晶圆表面以及背面颗粒去除以及金属污染物的去除（清洗）

2.适用于各种工艺的湿法工艺，背面面膜刻蚀，Resist剥离金属膜刻蚀金属布线形成、氧化膜去除，残渣物去除等湿法刻蚀。

Silicon carbide substrate material final cleaning field market accounted for 80%MTK single piece precision wet treatment equipment is to treat with liquid medicine, megasonic wave, two fluid Jet, pure water washing, drying and other processing means.

1. Suitable for wafer surface and back particle removal and removal of metal contaminants (cleaning)

2. Suitable for wet process of various processes, back mask etching, Resist stripping metal film etching metal wiring formation, oxide film removal, residue removal and other wet process etching.