尊敬的业内同仁，您好！

中电科风华信息装备股份有限公司诚挚地邀请您参加11月6日-8日在中国深圳·深圳坪山格兰云天国际酒店举办的第五届亚太碳化硅及相关材料国际会议。

在会议期间，中电科风华信息装备股份有限公司将在NO.46展台上展出最新产品和技术，我们诚挚地邀请您莅临展台，与我们进行深入的交流和探讨，共同探索合作与发展的可能性。

Distinguished delegates，

CETC Fenghua Information-Equipment Co., Ltd. sincerely invite you to participate in the 5th Asia-Pacific Conference on Silicon Carbide and Related Materials (APCSCRM 2024)！

APCSCRM 2024 will be grandly held in Grand Skylight International Hotel Shenzhen Pingshan, China, on November 06-08, 2024, for better accelerating the academic research, technological progress and industrial upgrading of silicon carbide and other wide bandgap semiconductor industries in the Asia-Pacific region.

During the conference, CETC Fenghua Information-Equipment Co., Ltd. will exhibit the latest products and technologies on booth NO.46. We sincerely invite you to visit our booth for in-depth exchanges and discussions, and explore the possibilities of cooperation and development together.

企业简介/Company profile

中电科风华信息装备股份有限公司成立于1998年，注册在山西转型综合改革示范区，是中国电科半导体装备领域核心成员单位，是首批国家级创新型企业，国家级“专精特新”小巨人企业，国家第三代半导体技术创新中心（山西）共建单位。

公司致力于国产高端电子专用装备研发，以“国内卓越、世界一流”为发展目标，聚焦半导体产业高端装备国产化，拥有自主知识产权200余项，获得省部级科技进步奖15项。产品布局分为半导体显示、半导体检测、智能制造等几大专用生产设备板块，能够全方位为客户提供个性化定制服务、系统集成解决方案。

CETC Fenghua Information Equipment Co., Ltd. was established in 1998 and registered in the Shanxi Transformation and Comprehensive Reform Demonstration Zone. It is one of the first batch of state-level innovative enterprises, a national-level "specialized, special and new" small giant enterprise, and a co-constructor of the National Third-Generation Semiconductor Technology Innovation Center (Shanxi).

The company takes "domestic excellence and world-class" as its development goal, focuses on the localization of high-end equipment in the semiconductor industry, has more than 200 independent intellectual property rights, and has won 15 provincial and ministerial science and technology progress awards. The product layout is divided into four special production equipment sectors including semiconductor display, wafer defect inspection,smart manufacturings, which can provide customers with personalized customized services and system integration solutions in an all-round way.

产品简介/About Production

1、晶圆全自动检测设备 Mars 4410/ Mars 4420

Wafer automatic inspection equipment Mars 4410/Mars 4420

应用于化合物半导体衬底片、外延片的全自动缺陷检测，并可兼容蓝宝石、LED的缺陷检测。设备采用明场微分干涉相差、暗场散射、光致发光等多种检测手段。具有多通道同步单次检测，低噪声和高分辨率成像、高检测通量和高检出率等优势。

Mars 4410/4420 is designed for advanced characterization of substrate and epitaxial defects for compound semiconductor wafers.This automated wafer inspection system captures a variety of critical defects with its integrated multiple optical inspection techniques and deep learning defect identification algorithm,aiming to improve the yield of compound semi-conductor based chips.

2、GaN外延缺陷检测设备Saturn 3510

GaN epitaxial automatic inspection equipment Saturn 3510

应用于GaN外延片的自动化缺陷检测。设备采用点共焦旋转扫描的工作原理进行缺陷检测，可以自动实时对焦和多通道采集数据，具有低噪声和高分辨率成像等优势，采用基于深度学习的自动缺陷检测算法，晶圆检测与数据分析能够并行处理，满足4、6、8英寸晶圆的生产检测与器件良率提升的需求。

Saturn 3510 is designed for advanced characterization of GaN epitaxial defects for compound semiconductor wafers.This automated wafer inspection system captures a variety of critical defects with its integrated multiple optical inspection techniques and deep learning defect identification algorithm,aiming to improve the yield of compound semi-conductor based chips.

3、位错自动检测设备Mars 4400

SiC etched wafer dislocations inspection equipment

Mars 4400

SiC晶圆腐蚀后的位错检测设备。设备采用微分干涉相差的光学显微成像技术,可进行全片扫描并采集完整数据,计算并自动统计位错数量与密度,生成位错密度图。

Mars 4400 is designed to inspect,classiy，and count the dislocations on SiC wafers after KOH etching.This inspection system utilizes differential interference contrast (DIC) to inspect dislocations,incuding BPDs, TEDs, and TSDs.Its high performance computing capability enables >3 millon defect inspection and analysis in parallel.This tool can provide detailed defect list with coordinates of each defect,and/or defect density map as statstical results for process analysis and control.

4、加工过程缺陷自动化检测设备SDI-10/PDI-10

Processing process defect automatic inspection equipment SDI-10/PDI-10

SDI-10/PDI-10主要用于检测各类材质的晶片(包括透明与非透明)加工工艺中产生的双面线痕、边缘裂纹、崩边、倒角面型等等，兼容标准4，6，8英寸及其他非标尺寸，支持切割片、研磨片、抛光片、籽晶片、衬底片、外延片、腐蚀片的缺陷检测分析。支持晶片厚度最厚可达800um，可检测2-200um的线痕并输出整张晶圆分布图。

SDI-10&PDI-10 provide a more cost-effective and accurate method than manual visual checking to inspect various kinds of defects during substrates (Si, SiC, Sapphire, Glass, Panels, etc) or epitaxial wafers manufacturing processes,e.g. sawing traces, cracks, scratches.With its advanced system architecture,other inspection and measurement functions can be customized and integrated.